Hydrogen is used extensively in wafer fabrication processes for epitaxial deposition in silicon and compound semiconductors. The flammability of H-2 is a primary safety issue in piping and exhaust gas management of hydrogen-laden processes. Management of H-2 is complicated by the presence of epi process gases, which can present additional fire and environmental hazards. Special considerations for exhaust management are required to deal with hydrogen's flammability and the risk of explosion at various levels of gas concentrations.